¼±Åà - È»ìǥŰ/¿£ÅÍŰ
´Ý±â - ESC
KMLE °Ë»ö
°Ë»ö ¼³Á¤
¿Â¶óÀÎ ÀÇÇмÀû
ÀÇÇпë¾î »çÀü
ÀÇÇоà¾î
ÀÇÇлçÀü
ÇÑ¿µ/¿µÇÑ»çÀü
¿µ¿µ»çÀü
»çÀÌÆ® ¼Ò°³
Àç°Ë»ö
"double exposure technique"¿¡ ´ëÇÑ °æºÏ´ëÇб³ Ä¡°ú´ëÇÐ ±¸°³»°úÇб³½Ç »çÀü ¼¼ºÎ °Ë»ö °á°úÀÔ´Ï´Ù
°æºÏ´ë Ä¡°ú´ëÇÐ ±¸°³»°ú ±³½Ç »çÀü À¯»ç °Ë»ö °á°ú :
15
ÆäÀÌÁö:
2
¿µ¹®
ÇѱÛ
¼³¸í
radiation exposure
¹æ»ç¼± ³ëÃâ, ¹æ»ç¼± Á¶»ç
short-term exposure
´Ü±â ³ëÃâ
subanesthetic exposure
¸¶Ãë ¿ªÇÏ ÇÇÆø
water-air exposure rate
¼ö°øÁßÁ¶»ç¼±·®ºñ, ¹°-°ø±âÁßÁ¶»ç¼±·®ºñ
afterloading technique
ÈÄ ÀåÁø¹ý
analytical technique
ÇÐÁú ¸ð±â
aseptic technique
¹«±Õ¼ú
banding technique chromosome
´ë»ó ±â¼ú ¿°»öü
bilateral manual manuplation technique
¾çÃø¼º ¼öÁ¶ÀÛ¹ý
bisecting angle technique
µî°¢ ÃÔ¿µ¹ý, À̵îºÐ°¢ ÃÔ¿µ¹ý
chewing technique
¾Ã´Â ¼ú½Ä
collection technique
äÃë¹ý
crevicular brushing technique
¿±¸³» Ä¡¼ÖÁú¹ý
cross fire technique
½ÊÀÚÆ÷È Á¶»ç¹ý
cryoneuroablative technique
µ¿°á ½Å°æ ÀýÁ¦¼ú
ÀÌÀü
´ÙÀ½
ÀÌ ¾Æ·¡ ºÎÅÍ´Â °á°ú°¡ ¾ø½À´Ï´Ù.
°æºÏ´ë Ä¡°ú´ëÇÐ ±¸°³»°ú ±³½Ç »çÀü ¸ÂÃã °Ë»ö °á°ú :
0
ÆäÀÌÁö:
2
¿µ¹®
ÇѱÛ
¼³¸í
ÀÌÀü
ÅëÇÕ°Ë»ö ¿Ï·á
ÀÌÀü
´ÙÀ½