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"reduced interference pattern"¿¡ ´ëÇÑ ´ëÇÑ»ýÈÇкÐÀÚ»ý¹°ÇÐȸ ÀÇÇпë¾î ¼¼ºÎ °Ë»ö °á°úÀÔ´Ï´Ù
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ÇѱÛ
Laue pattern
¶ó¿ì¿¡ ÆÐÅÏ
pattern method
ÆäÅϹý(Ûö)
powder pattern
ºÐ¸»(ÝÏØÇ) ÆÐÅÏ
x-ray diffraction pattern
X¼±(àÊ) ȸÀý(üÞï¹) ÆÐÅÏ
reduced mean residue rotation
ȯ»ê Æò±Õ Àܱâ ȸÀü(üµß©øÁгíÑÐñüÞï®)
reduced osmotic pressure
ȯ»ê »ïÅõ¾Ð(üµß©ß¶÷âäâ)
reduced scattered light intensity
ȯ»ê »ê¶õ±¤ °µµ(üµß©ß¤Õ¯ÎÃËÓø)
reduced substrate concentration
ȯ»ê ±âÁú ³óµµ(üµß©Ñ¨òõÒØÓø)
reduced viscosity
ȯ»ê Á¡µµ(üµß©ïÄÓø)
chemical interference
ÈÇÐÀû °£¼·(ûùùÊîÜÊÎàï)
constructive interference
º¸° °£¼·(ÜÍËÊÎàï)
destructive interference
"»ó¼â°£¼·(ßÓáíÊÎàï),"
homologous interference
µ¿Á· °£¼·(ÔÒðéÊÎàï)
interference
°£¼·(ÊÎàï)
interference filter
°£¼·(ÊÎàï)ÇÊÅÍ
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0
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