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"reduced interference pattern"¿¡ ´ëÇÑ ´ëÇÑ»ýÈ­ÇкÐÀÚ»ý¹°ÇÐȸ ÀÇÇпë¾î ¼¼ºÎ °Ë»ö °á°úÀÔ´Ï´Ù
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  • Laue pattern
    ¶ó¿ì¿¡ ÆÐÅÏ
  • pattern method
    ÆäÅϹý(Ûö)
  • powder pattern
    ºÐ¸»(ÝÏØÇ) ÆÐÅÏ
  • x-ray diffraction pattern
    X¼±(àÊ) ȸÀý(üÞï¹) ÆÐÅÏ
  • reduced mean residue rotation
    ȯ»ê Æò±Õ Àܱâ ȸÀü(üµß©øÁгíÑÐñüÞï®)
  • reduced osmotic pressure
    ȯ»ê »ïÅõ¾Ð(üµß©ß¶÷âäâ)
  • reduced scattered light intensity
    ȯ»ê »ê¶õ±¤ °­µµ(üµß©ß¤Õ¯ÎÃË­Óø)
  • reduced substrate concentration
    ȯ»ê ±âÁú ³óµµ(üµß©Ñ¨òõÒØÓø)
  • reduced viscosity
    ȯ»ê Á¡µµ(üµß©ïÄÓø)
  • chemical interference
    È­ÇÐÀû °£¼·(ûùùÊîÜÊÎàï)
  • constructive interference
    º¸°­ °£¼·(ÜÍË­ÊÎàï)
  • destructive interference
    "»ó¼â°£¼·(ßÓáíÊÎàï),"
  • homologous interference
    µ¿Á· °£¼·(ÔÒðéÊÎàï)
  • interference
    °£¼·(ÊÎàï)
  • interference filter
    °£¼·(ÊÎàï)ÇÊÅÍ
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