¼±Åà - È­»ìǥŰ/¿£ÅÍŰ ´Ý±â - ESC

 
"reduced interarch distance"¿¡ ´ëÇÑ ´ëÇÑ»ýÈ­ÇкÐÀÚ»ý¹°ÇÐȸ ÀÇÇпë¾î ¼¼ºÎ °Ë»ö °á°úÀÔ´Ï´Ù
´ëÇÑ»ýÈ­ÇкÐÀÚ»ý¹°ÇÐȸ ¿ë¾î »çÀü °Ë»ö À¯»ç °Ë»ö °á°ú : 10 ÆäÀÌÁö: 1
  • ¿µ¹®
    ÇѱÛ
  • distance map
    °Å¸® Áöµµ(ò¢Óñ) (ÔÒ) contact map
  • map distance
    Áöµµ°Å¸®(ò¢ÓñËå×î)
  • mutation distance
    º¯ÀÌ(ܨì¶)°Å¸®
  • reduced mean residue rotation
    ȯ»ê Æò±Õ Àܱâ ȸÀü(üµß©øÁгíÑÐñüÞï®)
  • reduced osmotic pressure
    ȯ»ê »ïÅõ¾Ð(üµß©ß¶÷âäâ)
  • reduced scattered light intensity
    ȯ»ê »ê¶õ±¤ °­µµ(üµß©ß¤Õ¯ÎÃË­Óø)
  • reduced substrate concentration
    ȯ»ê ±âÁú ³óµµ(üµß©Ñ¨òõÒØÓø)
  • reduced viscosity
    ȯ»ê Á¡µµ(üµß©ïÄÓø)
  • relative migration distance
    »ó´ë À̵¿°Å¸®(ßÓÓßì¹ÔÑËå×î)
  • van der Waals distance
    ¹Ý µ§ ¹ß½º °Å¸®
ÀÌ ¾Æ·¡ ºÎÅÍ´Â °á°ú°¡ ¾ø½À´Ï´Ù.
´ëÇÑ»ýÈ­ÇкÐÀÚ»ý¹°ÇÐȸ ¿ë¾î »çÀü °Ë»ö ¸ÂÃã °Ë»ö °á°ú : 0 ÆäÀÌÁö: 1
  • ¿µ¹®
    ÇѱÛ
ÅëÇÕ°Ë»ö ¿Ï·á