¼±Åà - È»ìǥŰ/¿£ÅÍŰ
´Ý±â - ESC
KMLE °Ë»ö
°Ë»ö ¼³Á¤
¿Â¶óÀÎ ÀÇÇмÀû
ÀÇÇпë¾î »çÀü
ÀÇÇоà¾î
ÀÇÇлçÀü
ÇÑ¿µ/¿µÇÑ»çÀü
¿µ¿µ»çÀü
»çÀÌÆ® ¼Ò°³
Àç°Ë»ö
"beam"¿¡ ´ëÇÑ ´ëÇÑÀÇÇù ÀÇÇпë¾î ¼¼ºÎ °Ë»ö °á°úÀÔ´Ï´Ù
´ëÇÑÀÇÇù ÀÇÇпë¾î »çÀü °Ë»ö ¸ÂÃã °Ë»ö °á°ú :
14
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
beam
1. ¹æÃâ 2. µéº¸ 3. ¼±, ºö, ºû»ì
beam alignment
ºöÁ¤·Ä
beam attenuation
ºö°¨¼è, ºö¾àÈ
beam configuration
ºö¹èÄ¡, ºö±¸Á¶, ºöÇüÅÂ
beam depth
µéº¸±íÀÌ, À½¼Ó±íÀÌ
beam hardening effect
ºö°æÈÈ¿°ú
beam profile
ºöÃø¸éµµ, ¼ÓÃø¸é»ó, À½¼ÓÃø¸é»ó
beam scale
´ëÀú¿ï
beam splitting
¼±ºÐ¿
beam width
µéº¸Æø, ¼ÓÆø
beam-modifying device
ºöº¯°æ±â±¸, ºû»ìº¯°æ±â±¸
beam-shaping device
ºöÁ¤Çü±â±¸, ºû»ìÁ¤Çü±â±¸
beam-thickness artifact
¼±µÎ²²Çã»ó
beam-width artifact
ºû»ìÆøÀΰø¹°
´ëÇÑÀÇÇù ÀÇÇпë¾î »çÀü °Ë»ö À¯»ç °Ë»ö °á°ú :
15
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
divergent beam
ÆÛÁüºû»ì, ÆÛÁü±¤¼±
double-beam spectrophotometer
ÀÌÁß¼±ºÐ±¤±¤µµ°è
electron beam
ÀüÀÚ¼±, ÀüÀÚºö
fan beam
ºÎä²Ãºö
fan beam collimator
ºÎä²ÃºöÁ¶Áرâ
mixed beam irradiation
È¥ÇÕºû»ìÁ¶»ç, È¥ÇÕºöÁ¶»ç
moving beam irradiation
À̵¿ºû»ìÁ¶»ç, À̵¿ºöÁ¶»ç
narrow beam
Á¼Àººö, Çùºö
opposite-beam interpolation
¸Â¼¶ºû»ìº¸¿Ï¹ý, ´ëÇâºöº¸¾È¹ý
pencil beam
°¡´Âºû»ì
radiation beam
¹æ»ç¼±¹æÃâ, ¹æ»ç¼±ºö
sound beam
¼Ò¸®ºö, À½¼Ó
stereotactic external-beam irradiation
Á¤À§¹Ù±ùºû»ìÁ¶»ç, ÀÔüÀûü¿ÜºöÁ¶»ç
unfocused beam
ºñÁý¼Ó¼ºÀ½¼Ó, ºñÁý¼Óºö
ultrasonic beam
ÃÊÀ½ÆÄºö, ÃÊÀ½ÆÄ¼Ó
´ÙÀ½
´ëÇÑÀÇÇù Çʼö ÀÇÇпë¾îÁý »çÀü °Ë»ö ¸ÂÃã °Ë»ö °á°ú :
1
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
beam
1. ¹æÃâ, 2. µéº¸
´ëÇÑÀÇÇù Çʼö ÀÇÇпë¾îÁý »çÀü °Ë»ö À¯»ç °Ë»ö °á°ú :
1
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
radiation beam
¹æ»ç¼±¹æÃâ
¿¾ ´ëÇÑÀÇÇù ÀÇÇпë¾î »çÀü °Ë»ö ¸ÂÃã °Ë»ö °á°ú :
14
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
beam
µéº¸, ºû»ì, ¼Ó, ¼±, ±¤¼Ó, À½¼Ó
beam alignment
ºöÁ¤·Ä
beam attenuation
ºö°¨¼è, ºö¾àÈ
beam configuration
ºö¹èÄ¡, ºö±¸Á¶, ºöÇüÅÂ
beam depth
µéº¸±íÀÌ, ¼Ò¸®µéº¸±íÀÌ, À½¼Ó±íÀÌ
beam hardening effect
ºö°æÈÈ¿°ú
beam profile
ºöÃø¸éµµ, ¼ÓÃø¸é»ó, À½¼ÓÃø¸é»ó
beam scale
´ëÀú¿ï
beam splitting
¼±ºÐ¿
beam width
µéº¸Æø, ¼ÓÆø,
beam-modifying device
ºöº¯°æ±â±¸, ºû»ìº¯°æ±â±¸
beam-shaping device
ºöÁ¤Çü±â±¸, ºû»ìÁ¤Çü±â±¸
beam-thickness artifact
À½¼ÓµÎ²²Çã»ó, À½¼ÓµÎ²²Àΰø¹°
beam-width artifact
µéº¸ÆøÇã»ó, ¼ÓÆøÀΰø¹°
¿¾ ´ëÇÑÀÇÇù ÀÇÇпë¾î »çÀü °Ë»ö À¯»ç °Ë»ö °á°ú :
15
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
divergent beam
µéº¸¹ú¸², ÆÛÁüºû»ì, ÆÛÁü±¤¼±È®»êºö
electron beam
ÀüÀÚ¼±
fan beam
ºÎä²Ãºö
narrow beam
Á¼Àººö, Çùºö
pencil beam
°¡´Âºû»ì
radiation beam
¹æ»ç¼±ºö, ¹æ»ç¼±¼Ó
sound beam
¼Ò¸®µéº¸, À½¼Ó
ultrasonic beam
ÃÊÀ½ÆÄµéº¸, ÃÊÀ½ÆÄ¼Ó
unfocused beam
ºñÁý¼Ó¼ºÀ½¼Ó
wedged beam
½û±âºö
fan beam collimator
ºÎä²ÃºöÁ¶Áرâ
double-beam spectrophotometer
ÀÌÁß¼±ºÐ±¤±¤µµ°è
x-ray beam dosimetry
¿¢½º¼±¼±·®ÃøÁ¤
electron beam symmetry
ÀüÀÚ¼±´ëĪ
x-ray beam flatness
¿¢½º¼±ºöÆíÆò
´ÙÀ½
¿¾ ´ëÇÑÀÇÇù 2 ÀÇÇпë¾î »çÀü °Ë»ö À¯»ç °Ë»ö °á°ú :
7
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
aiming beam
Á¶Áر¤¼±
frequency of beam
À½¼Ó (ëåáÖ) ÀÇ Á֯ļö (ñ²÷îâ¦)
geometry of beam
À½¼ÓÀÇ ¸ð¾ç
geometry of beam
À½¼Ó (ëåáÖ)ÀÇ ¸ð¾ç
profile to X-ray beam
Á¾´Ü¸é, ¿·¸é
proton beam therapy
¾çÀÚ¼±Ä¡·á
radiation beam
¹æ»ç¼±ºö
¿¾ ´ëÇÑÀÇÇù 3 ÀÇÇпë¾î »çÀü °Ë»ö ¸ÂÃã °Ë»ö °á°ú :
15
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
beam
±¤¼Ó(ÎÃáÖ)
beam
À½¼Ó (ëåáÖ)
beam
¼Ó, ¼±, ±¤¼Ó(Ë´ËÛ).
beam
¼Ó, ¼±, ±¤¼Ó(ÎÃáÖ).
beam
¼Ó
beam alignment
ºöÁ¤·Ä
beam attenuation
ºö°¨¼è
beam axis
ºöÃà
beam configuration
ºö¹èÄ¡, ºö±¸Á¶, ºöÇüÅÂ
beam depth
À½¼Ó (ëåáÖ) ±íÀÌ
beam depth
¼Ó ±íÀÌ
beam diameter
À½¼Ó Á÷°æ (ëåáÖ òÁÌè)
beam diameter
¼Ó Á÷°æ
beam direction
ºö¹æÇâ
beam geometry
À½¼Ó ¸ð¾ç
´ÙÀ½
¿¾ ´ëÇÑÀÇÇù 3 ÀÇÇпë¾î »çÀü °Ë»ö À¯»ç °Ë»ö °á°ú :
15
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
aiming beam
Á¶Áر¤¼±
atomic beam
¿øÀÚºö
convergent beam
ÁýÇÕ±¤¼±(â¥Ö°ÎÃáÖ).
corpuscular beam
ÀÔÀÚ¼±(í£íàÊ).
divergent beam
È®»êºö
divergent beam
°³»ê ±¤¼Ó
double-beam spectrophotometer
ÀÌÁß¼±ºÐ±¤°è
electron beam
ÀüÀÚ¼±(ï³íàÊ).
electron beam contamination
ÀüÀÚ¼±¿À¿°
electron beam flatness
ÀüÀÚ¼±ÆíÆòµµ
electron beam performance
ÀüÀÚ¼±¼º´É
electron beam symmetry
ÀüÀÚ¼±´ëεµ
electron beam therapy
ÀüÀÚ¼±Ä¡·á
electron beam therapy
ÀüÀÚ¼±Ä¡·á(¡ö½èþ).
electron-beam therapy
ÀüÀÚ¼± Ä¡·á
´ÙÀ½
ÀÌ ¾Æ·¡ ºÎÅÍ´Â °á°ú°¡ ¾ø½À´Ï´Ù.
¿¾ ´ëÇÑÀÇÇù 2 ÀÇÇпë¾î »çÀü °Ë»ö ¸ÂÃã °Ë»ö °á°ú :
0
ÆäÀÌÁö:
1
¿µ¹®
ÇѱÛ
ÅëÇÕ°Ë»ö ¿Ï·á
´ÙÀ½